Atomic force microscope (AFM) based anodization nanolithography on semiconducting layers is a useful tool for nanoscale fabrication. A custom AFM patterning technique has been created that couples CAD with the lithographic capabilities of the AFM. Designed nanostructures to be deposited on a silicon substrate are rendered as a three-dimensional model using CAD. AFM based anodization nanolithography is then used to replicate the features at the nanoscale using automated voltage bias and humidity modulation as prescribed by the model and dictated by the system. The work presented outlines the advantages and limitations when three-dimensional modeling is combined with nanoscale lithography using an AFM.

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