For crystal materials, thermal conductivity (TC) is proportional to T3 at low temperatures and to T−1 at high temperatures. TCs of most amorphous materials decrease with the decreasing temperatures. If a material is thin film, boundary will influence the TC and then influence the temperature dependence. In this paper, we calculate the TC of crystal and amorphous SiO2 thin films, which is a commonly used material in micro devices and Integrated Circuits, by NEMD simulations. The calculation temperatures are from 100K to 700K and the thicknesses are from 2nm to 8nm. TCs of crystal thin films reach their peak values at different temperatures for different thicknesses. The smaller thickness the larger peak values obtained. But for amorphous thin films, the results show that the temperature dependence of thin films is the same as bulk materials and not relative to their thicknesses. The obtained temperature dependence of the thin films is consistent with some previous measurements and the theory predictions.
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ASME 2007 5th International Conference on Nanochannels, Microchannels, and Minichannels
June 18–20, 2007
Puebla, Mexico
Conference Sponsors:
- Nanotechnology Institute
ISBN:
0-7918-4272-X
PROCEEDINGS PAPER
Temperature Dependence of Thermal Conductivity of Amorphous and Crystal Thin Film by Molecular Dynamics Simulation
Zhengxing Huang,
Zhengxing Huang
Dalian University of Technology, Dalian, China
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Zhenan Tang,
Zhenan Tang
Dalian University of Technology, Dalian, China
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Suyuan Bai,
Suyuan Bai
Dalian University of Technology, Dalian, China
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Jun Yu
Jun Yu
Dalian University of Technology, Dalian, China
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Zhengxing Huang
Dalian University of Technology, Dalian, China
Zhenan Tang
Dalian University of Technology, Dalian, China
Suyuan Bai
Dalian University of Technology, Dalian, China
Jun Yu
Dalian University of Technology, Dalian, China
Paper No:
ICNMM2007-30085, pp. 763-766; 4 pages
Published Online:
May 28, 2009
Citation
Huang, Z, Tang, Z, Bai, S, & Yu, J. "Temperature Dependence of Thermal Conductivity of Amorphous and Crystal Thin Film by Molecular Dynamics Simulation." Proceedings of the ASME 2007 5th International Conference on Nanochannels, Microchannels, and Minichannels. ASME 5th International Conference on Nanochannels, Microchannels, and Minichannels. Puebla, Mexico. June 18–20, 2007. pp. 763-766. ASME. https://doi.org/10.1115/ICNMM2007-30085
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