In semiconductor manufacturing process, very accurate temperature control is required. In this work we studied precise temperature control methods for a simple model by numerical simulation. To minimize temperature change at an object position of a vertical plate with varying a noise-heat-generation, we calculated unsteady temperature change of the plate under the effect of a feedback control and a feed-forward control of a control-heater. The temperature change at the object position can be decreased 1/10 times (0.7°C) using the feedback control of 2 s monitoring-time-step with the control-heater placed between the object position and the noise-heat-generation position. The temperature change at the object position can be decreased 1/1000 times (0.001°C) using the feed-forward control of 2 s monitoring-time-step and 5 s forecasting-time with the control-heater placed between the noise-heat-generation position and the object position.

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