In this paper, we study the chemical vapor deposition (CVD) process used to hermetically coat optical fibers during draw. Temperature is calculated by coupling radiation and convection heat transfer by the reactor walls and gas flow with a radially-lumped heat transfer model for the moving optical fiber. Multi-component species diffusion is modeled using the Maxwell-Stefan equations. Gas-phase reaction kinetics is modeled using a 2-step chemical kinetics mechanism derived from RRKM theory with detailed kinetics data compiled from literature. Surface reaction kinetics are described using collision theory in which a sticking coefficient is used as an empirical parameter to predict surface reactions. A parameter study is carried out with various optical fiber inlet temperature and drawing speed, and validated with experiment results.

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