In this paper, we propose a three-dimentional multi-layered flow generator fabricated by inclined UV lithography to expose a single layerded photoresist coated on a patterned mask. To confirm the validity of the proposed generator, we applied the three-layered flow generator as a passive lamination micromixer. By comparing two types of fabricated micromixers, the three-layered micromixer achieves 1.64 times faster mixing rate than a conventional Y-shaped one due to the shortening of the diffusion length. The fabricated flow generator can be applied for a passive micromixer with laminated and/or secondary flows, a sheath flow generator, and a multi-layered emulsion system.

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