Optimizing Computer Controlled-Polishing of Flat Surfaces

The aim of this study is to optimize the Computer Controlled Polishing (CCP) of flat surfaces based on discretization of tool path. First, a new method has been developed to simulate the polishing Process. This method capable of expanding any tool path such as spiral, raster or even random over the surface, meaning that it has the capacity of simulating polishing process under different tool path strategies. Second, a numerical optimization method is applied to optimize the dwell time distribution over the defined tool path. The new method developed in this study was conducted to operate polishing process of a flat lens with 128 mm in diameter and initial surface roughness of 3.975 μm for PV and 987 nm for rms using a 3-axis CNC machine. After two passes of polishing, the final surface roughness reduced to 784 nm for PV and 190 nm for rms which shows around 80 percent reduction in surface roughness for PV and rms.