We consider the development of capacitively and inductively coupled microplasma reactors for detection, control and chemical transformation in microelectromechanical (mems) applications. Current progress in fabrication techniques, including hot embossing, soft and laser lithography is reviewed. Numerical simulations of the interaction of electromagnetic fields with plasma flows in which the plasma flow is at right angles with the electric and magnetic field are analyzed. Two cases in which the electromagnetic fields induce lorentz forces that control the flow are presented. In the first case, the lorentz forces act along the flow direction and produce and increase in the axial pressure that accelerates the flow (micropump configuration). In the second case, the lorentz forces act against the flow by causing a drop in the axial pressure that slows down the flow (microbrake configuration).
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ASME 7th Biennial Conference on Engineering Systems Design and Analysis
July 19–22, 2004
Manchester, England
ISBN:
0-7918-4175-8
PROCEEDINGS PAPER
Capacitively and Inductively Coupled Plasma for MEMS Applications
Jaime H. Lozano-Parada,
Jaime H. Lozano-Parada
University of Sheffield, Sheffield, UK
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William B. J. Zimmerman
William B. J. Zimmerman
University of Sheffield, Sheffield, UK
Search for other works by this author on:
Jaime H. Lozano-Parada
University of Sheffield, Sheffield, UK
William B. J. Zimmerman
University of Sheffield, Sheffield, UK
Paper No:
ESDA2004-58437, pp. 545-551; 7 pages
Published Online:
November 11, 2008
Citation
Lozano-Parada, JH, & Zimmerman, WBJ. "Capacitively and Inductively Coupled Plasma for MEMS Applications." Proceedings of the ASME 7th Biennial Conference on Engineering Systems Design and Analysis. Volume 3. Manchester, England. July 19–22, 2004. pp. 545-551. ASME. https://doi.org/10.1115/ESDA2004-58437
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