We consider the development of capacitively and inductively coupled microplasma reactors for detection, control and chemical transformation in microelectromechanical (mems) applications. Current progress in fabrication techniques, including hot embossing, soft and laser lithography is reviewed. Numerical simulations of the interaction of electromagnetic fields with plasma flows in which the plasma flow is at right angles with the electric and magnetic field are analyzed. Two cases in which the electromagnetic fields induce lorentz forces that control the flow are presented. In the first case, the lorentz forces act along the flow direction and produce and increase in the axial pressure that accelerates the flow (micropump configuration). In the second case, the lorentz forces act against the flow by causing a drop in the axial pressure that slows down the flow (microbrake configuration).
Capacitively and Inductively Coupled Plasma for MEMS Applications
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Lozano-Parada, JH, & Zimmerman, WBJ. "Capacitively and Inductively Coupled Plasma for MEMS Applications." Proceedings of the ASME 7th Biennial Conference on Engineering Systems Design and Analysis. Volume 3. Manchester, England. July 19–22, 2004. pp. 545-551. ASME. https://doi.org/10.1115/ESDA2004-58437
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