Electron beam (E-beam) vacuum deposition is extensively used for the production of precision optical coatings due to its ability to economically deposit a wide range of source materials. To manufacture superior optical devices, high precision optical coatings are required. One measure of the process capabilities is the accuracy and repeatability of each layer’s optical thickness. A major limitation to controlling optical thickness, especially for large-scale and multi-layer optics, is the variability in the vapor plume geometry due to non-uniform evaporation of the source material. For sublimating materials, like silica, variations in the size and direction of the vapor plume has been attributed to topography on the melt surface, which forms due to uneven source depletion caused by non-uniform heating. In this paper, an experimentally based adaptive system identification method is used to develop custom sweep patterns to control a complicated nonlinear system with both process and equipment nonlinearities.
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ASME 2010 Dynamic Systems and Control Conference
September 12–15, 2010
Cambridge, Massachusetts, USA
Conference Sponsors:
- Dynamic Systems and Control Division
ISBN:
978-0-7918-4418-2
PROCEEDINGS PAPER
Development of an Adaptive System ID Method for Enabling Advanced E-Beam Sweep Pattern Design Available to Purchase
Emerson Speyerer,
Emerson Speyerer
Boston University, Boston, MA
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Michael Gevelber,
Michael Gevelber
Boston University, Boston, MA
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Dennis Radgowski
Dennis Radgowski
Cyber Materials, LLC, Boston, MA
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Emerson Speyerer
Boston University, Boston, MA
Michael Gevelber
Boston University, Boston, MA
Dennis Radgowski
Cyber Materials, LLC, Boston, MA
Paper No:
DSCC2010-4225, pp. 309-316; 8 pages
Published Online:
January 25, 2011
Citation
Speyerer, E, Gevelber, M, & Radgowski, D. "Development of an Adaptive System ID Method for Enabling Advanced E-Beam Sweep Pattern Design." Proceedings of the ASME 2010 Dynamic Systems and Control Conference. ASME 2010 Dynamic Systems and Control Conference, Volume 2. Cambridge, Massachusetts, USA. September 12–15, 2010. pp. 309-316. ASME. https://doi.org/10.1115/DSCC2010-4225
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